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AMAT  0920-01070   high-performance RF Power Generator
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AMAT 0920-01070 high-performance RF Power Generator

AMAT  0920-01070   high-performance RF Power Generator 

U.S.$17890.00
U.S.$15690.00
U.S.$14905.50
U.S.$14591.70
Weight:1.290KG
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(Inventory: 99999)
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Description

AMAT  0920-01070   high-performance RF Power Generator 


AMAT 0920-01070 is a high-performance RF Power Generator (specifically the RF20R model) manufactured by RF Power Products (RFPP, now part of Advanced Energy) for Applied Materials.

This unit is a water-cooled, high-frequency power source designed to provide the stable plasma energy required for critical semiconductor processes such as Etch, CVD, and PVD.

Technical Parameter Table

ParameterSpecification
Part Number0920-01070
ManufacturerRF Power Products (RFPP) / Applied Materials
Model NumberRF20R / RF20S Series
Output Frequency12.56 MHz (Typical)
Output Power2.2 kW (2200 Watts)
Cooling MethodWater-Cooled (Liquid)
Input Voltage208V / 250V AC
Manufacturer P/N7522354012
Output Impedance50 Ohms (Standard)

Related Models

These RF generators are often used alongside or replaced by similar units in the RFPP/Advanced Energy ecosystem:

0920-01047 (RF30S): Higher power 3.0 kW variant.

0920-01072: Specialized magnetron head often found in similar RF subsystems.

0190-13203 (AE HFV 8000): A more modern high-frequency variant from Advanced Energy.

0920-00050: Legacy RFPP generator models for 200mm tools.

Application Cases

The 0920-01070 is a "workhorse" component for plasma-enhanced manufacturing:

Plasma Etching: Providing the ionized gas energy to selectively remove material from the wafer surface with nanometer precision.

Chemical Vapor Deposition (CVD): Energizing precursor gases to deposit thin films onto the silicon substrate in Centura or Producer tools.

Chamber Cleaning: Used in remote plasma sources to clean the interior of the process chamber between production batches.

Product Advantages and Features

Exceptional Stability: Maintains precise power output even during the volatile impedance shifts that occur during plasma ignition.

Water-Cooled Efficiency: Liquid cooling allows the unit to maintain a small footprint while operating at high power levels without thermal drifting.

Fast Tuning Compatibility: Designed to interface seamlessly with AMAT’s Match Networks, ensuring near-zero reflected power.

Rugged RF Circuitry: Built to survive the high-vibration and electrically noisy environment of a sub-fab or tool rack.

Other Models in the Same Series

The RF20 / RF30 series has been a standard in AMAT tools for decades:

RF20S: Air-cooled variant for lower-duty applications.

RF20R: The "R" variant (like the 0920-01070) indicates the ruggedized, water-cooled version.

RF10S: 1.0 kW entry-level power source for smaller chamber applications.

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Installation and Maintenance

Cooling Connections: Ensure the cooling water is deionized and filtered. Inspect the inlet and outlet ports for calcium buildup or leaks before installation.

Electrical Safety: High Voltage / High Frequency Warning. Only personnel trained in RF safety should perform maintenance. Ensure the RF output cable (coaxial) is properly torqued to prevent arcing.

Calibration: After installation, the generator must be "zeroed" and calibrated with the tool’s software to ensure the commanded power matches the actual forward power.

Preventative Maintenance: Check the internal coolant flow sensors and interlock switches every 6 months to prevent the unit from overheating during high-power recipes.

Unique Product Description

The AMAT 0920-01070 (RFPP RF20R) is the literal "energy source" for plasma-based wafer fabrication.

In an industry where even a 1% deviation in power can ruin a multimillion-dollar batch of wafers, the RF20R provides the rock-solid 12.56 MHz frequency needed for consistent results.

Its liquid-cooled design ensures that it can run at maximum duty cycles for weeks on end, making it an essential component for high-volume fabs utilizing Applied Materials technology.



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